AFM imaging and fractal analysis of surface roughness of AlN epilayer on sapphire substrate

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Dyscyplina naukowa:
Rok:
2014
Typ publikacji:
Artykuł
Słowa kluczowe:
Aluminum nitride, Epitaxy, Substrate, Surface roughness, Atomic force microscopy, Fractal analysis
Autorzy:
  • Dinara Dallaeva
  • Ştefan Ţălu
  • Sebastian Stach
  • Pavel Škarvada
  • Pavel Tománek
  • Mihai Ţălu
  • Lubomir Grmela
Czasopismo:
Applied Surface Sciene
Ilość:
312
Strony:
81-86
Miesiąc:
Wrzesień
Streszczenie:
The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AlN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AlN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AlN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis).

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